THIN FILMS AND METHODS FOR THE PREPARATION THEREOF

Details for Australian Patent Application No. 2003201435 (hide)

Owner SILECS OY

Inventors RANTALA, Juha; TORMANEN, Turo; VISWANATHAN, Nungavaram; REID, Jason

Pub. Number AU-A-2003201435

PCT Number PCT/FI03/00036

PCT Pub. Number WO2003/059990

Priority 60/349,955 17.01.02 US; 60/395,418 13.07.02 US

Filing date 17 January 2003

Wipo publication date 30 July 2003

International Classifications

C08G 077/04 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C08G 077/14 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C08G 077/16 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C08G 077/18 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C08G 077/22 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C08G 077/24 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C08G 077/20 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C09D 183/04 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - Polysiloxanes

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

3 April 2003 Complete Application Filed

  Priority application(s): 60/349,955 17.01.02 US; 60/395,418 13.07.02 US

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2003201435

7 October 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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