METHOD OF USING HIGH YIELDING SPECTRA SCATTEROMETRY MEASUREMENTS TO CONTROL SEMICONDUCTOR MANUFACTURING PROCESSES, AND SYSTEMS FOR ACCOMPLISHING SAME

Details for Australian Patent Application No. 2002367742 (hide)

Owner ADVANCED MICRO DEVICES , INC.

Inventors REEVES, Steven, P.; STIRTON, James, Broc; LENSING, Kevin, R.; NARIMAN, Homi, E.

Pub. Number AU-A-2002367742

PCT Number PCT/US02/40273

PCT Pub. Number WO2003/074995

Priority 10/084,987 28.02.02 US

Filing date 17 December 2002

Wipo publication date 16 September 2003

International Classifications

G01N 021/956 Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light

G01N 021/95 Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light

G01N 021/47 Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light - Scattering, i.e. diffuse reflection

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

Event Publications

16 October 2003 Complete Application Filed

  Priority application(s): 10/084,987 28.02.02 US

23 October 2003 Application Open to Public Inspection

  Published as AU-A-2002367742

7 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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