RADIATION-SENSITIVE RESIN COMPOSITION

Details for Australian Patent Application No. 2002367625 (hide)

Owner JSR CORPORATION

Inventors IWANAGA, Shin-ichiro; IWAMOTO, Satoshi; KIMURA, Tooru; NISHIMURA, Hiroko; NISHIKAWA, Koji

Pub. Number AU-A-2002367625

PCT Number PCT/JP02/13072

PCT Pub. Number WO2003/069410

Priority 2002-40301 18.02.02 JP

Filing date 13 December 2002

Wipo publication date 4 September 2003

International Classifications

G03F 007/027 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

H05K 003/00 Apparatus or processes for manufacturing printed circuits

H01L 021/288 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

25 September 2003 Complete Application Filed

  Priority application(s): 2002-40301 18.02.02 JP

2 October 2003 Application Open to Public Inspection

  Published as AU-A-2002367625

10 March 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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