CLEANING GAS FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND CLEANING METHOD USING THE GAS

Details for Australian Patent Application No. 2002366920 (hide)

Owner SHOWA DENKO K.K.

Inventors OHNO, Hiromoto; OHI, Toshio

Pub. Number AU-A-2002366920

PCT Number PCT/JP02/13002

PCT Pub. Number WO2003/054247

Priority 2001-379401 13.12.01 JP; 60/391,622 27.06.02 US

Filing date 12 December 2002

Wipo publication date 9 July 2003

International Classifications

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

B08B 005/00 Cleaning by methods involving the use of air flow or gas flow

H01L 021/311 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

28 August 2003 Complete Application Filed

  Priority application(s): 2001-379401 13.12.01 JP; 60/391,622 27.06.02 US

2 October 2003 Application Open to Public Inspection

  Published as AU-A-2002366920

16 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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