SYSTEM AND METHOD FOR REDUCING PHOTORESIST PHOTO-OXIDATIVE DEGRADATION IN 193 NM PHOTOLITHOGRAPHY
Details for Australian Patent Application No. 2002366552 (hide)
Event Publications
28 August 2003 Application Open to Public Inspection
Published as AU-A-2002366552
28 August 2003 Complete Application Filed
Priority application(s): 10/017,871 11.12.01 US
26 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired
This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.
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