EVALUATING METHOD AND METHOD FOR MANUFACTURING EXPOSURE APPARATUS

Details for Australian Patent Application No. 2002365522 (hide)

Owner NIKON CORPORATION

Inventors HAYASHI, Tsunehito; TAKEDA, Kaname

Pub. Number AU-A-2002365522

PCT Number PCT/JP02/12271

PCT Pub. Number WO2003/046962

Priority 2001-359534 26.11.01 JP; 2002-238044 19.08.02 JP

Filing date 25 November 2002

Wipo publication date 10 June 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G01M 011/02 Testing of optical apparatus - Testing of optical properties

Event Publications

14 August 2003 Complete Application Filed

  Priority application(s): 2001-359534 26.11.01 JP; 2002-238044 19.08.02 JP

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002365522

12 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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