METHOD FOR THE FABRICATION OF SILICON NITRIDE, SILICON OXYNITRIDE, AND SILICON OXIDE FILMS BY CHEMICAL VAPOR DEPOSITION

Details for Australian Patent Application No. 2002365488 (hide)

Owner L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATIO

Inventors DUSSARAT, Christian; TSUKADA, Eri; GIRARD, Jean-Marc

Pub. Number AU-A-2002365488

PCT Number PCT/IB02/02910

PCT Pub. Number WO2003/046254

Priority 2001-367130 30.11.01 JP

Filing date 26 July 2002

Wipo publication date 10 June 2003

International Classifications

C23C 016/34 Chemical deposition or plating by decomposition - Nitrides

C23C 016/30 Chemical deposition or plating by decomposition - Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

C23C 016/40 Chemical deposition or plating by decomposition - Oxides

Event Publications

14 August 2003 Complete Application Filed

  Priority application(s): 2001-367130 30.11.01 JP

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002365488

19 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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