METHOD OF FAULT DETECTION FOR MATERIAL PROCESS SYSTEM

Details for Australian Patent Application No. 2002364719 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors DONOHUE, John; YUE, Hongyu

Pub. Number AU-A-2002364719

PCT Number PCT/US02/38989

PCT Pub. Number WO2003/058699

Priority 60/343,175 31.12.01 US

Filing date 31 December 2002

Wipo publication date 24 July 2003

International Classifications

H01L 021/306 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23F 001/00 Etching metallic material by chemical means

B05C 011/00 Component parts, details or accessories not specifically provided for in groups

C23C 014/32 Coating by vacuum evaporation, by sputtering or by ion implantation - by explosion

Event Publications

17 July 2003 Complete Application Filed

  Priority application(s): 60/343,175 31.12.01 US

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2002364719

16 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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