FLUORINATED POLYMERS HAVING ESTER GROUPS AND PHOTORESISTS FOR MICROLITHOGRAPHY

Details for Australian Patent Application No. 2002363539 (hide)

Owner E. I. DU PONT DE NEMOURS AND COMPANY

Inventors SCHADT, Frank, L., III; TAYLOR, Gary, Newton; FEIRING, Andrew, E.; FELDMAN, Jerald

Pub. Number AU-A-2002363539

PCT Number PCT/US02/36292

PCT Pub. Number WO2003/040827

Priority 60/348,426 26.10.01 US

Filing date 25 October 2002

Wipo publication date 19 May 2003

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

C08F 214/18 Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen

C08F 232/00 Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system

Event Publications

19 June 2003 Complete Application Filed

  Priority application(s): 60/348,426 26.10.01 US

24 July 2003 Application Open to Public Inspection

  Published as AU-A-2002363539

15 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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