METHOD AND DEVICE FOR PROCESSING SUBSTRATE, AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

Details for Australian Patent Application No. 2002362188 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors IGETA, Masanobu; SHINRIKI, Hiroshi; TAKAHASHI, Tsuyoshi; AOYAMA, Shintaro

Pub. Number AU-A-2002362188

PCT Number PCT/JP02/13851

PCT Pub. Number WO2003/063220

Priority 2002-14773 23.01.02 JP

Filing date 27 December 2002

Wipo publication date 2 September 2003

International Classifications

H01L 021/304 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/316 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/02 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof -

H01L 029/78 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

Event Publications

10 April 2003 Complete Application Filed

  Priority application(s): 2002-14773 23.01.02 JP

18 September 2003 Application Open to Public Inspection

  Published as AU-A-2002362188

7 October 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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