ASYMMETRIC SEMICONDUCTOR DEVICE HAVING DUAL WORK FUNCTION GATE AND METHOD OF FABRICATION

Details for Australian Patent Application No. 2002361895 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors MASZARA, Witold, P.; WANG, HaiHong; XIANG, Qi

Pub. Number AU-A-2002361895

PCT Number PCT/US02/41656

PCT Pub. Number WO2003/058711

Priority 10/036,210 26.12.01 US

Filing date 23 December 2002

Wipo publication date 24 July 2003

International Classifications

H01L 021/8238 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/033 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/84 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 027/092 Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate

H01L 027/12 Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate - the substrate being other than a semiconductor body, e.g. an insulating body

Event Publications

10 April 2003 Complete Application Filed

  Priority application(s): 10/036,210 26.12.01 US

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2002361895

9 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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