POLISHING PAD, PROCESS FOR PRODUCING THE SAME, AND METHOD OF POLISHING

Details for Australian Patent Application No. 2002361109 (hide)

Owner ASAHI KASEI KABUSHIKI KAISHA

Inventors NAKAMURA, Atsushi; FURUKAWA, Shoichi

Pub. Number AU-A-2002361109

PCT Number PCT/JP02/13709

PCT Pub. Number WO2003/058698

Priority 2001-400250 28.12.01 JP

Filing date 26 December 2002

Wipo publication date 24 July 2003

International Classifications

H01L 021/304 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

10 April 2003 Complete Application Filed

  Priority application(s): 2001-400250 28.12.01 JP

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2002361109

16 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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