SUBSTRATE TREATMENT APPARATUS

Details for Australian Patent Application No. 2002359947 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors INADA, Hiroichi; KISHITA, Naofumi

Pub. Number AU-A-2002359947

PCT Number PCT/JP02/13854

PCT Pub. Number WO2003/092055

Priority 2002-126972 26.04.02 JP

Filing date 27 December 2002

Wipo publication date 10 November 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/16 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Coating processes

B05C 011/08 Component parts, details or accessories not specifically provided for in groups - Spreading liquid or other fluent material by manipulating the work, e.g. tilting

Event Publications

3 April 2003 Complete Application Filed

  Priority application(s): 2002-126972 26.04.02 JP

18 December 2003 Application Open to Public Inspection

  Published as AU-A-2002359947

13 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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