METHODS OF FORMING CAPACITORS AND METHODS OF FORMING CAPCITOR DIELECTRIC LAYERS

Details for Australian Patent Application No. 2002359536 (hide)

Owner MICRON TECHNOLOGY, INC.

Inventors EPPICH, Denise, M.; BEAMAN, Kevin, L.

Pub. Number AU-A-2002359536

PCT Number PCT/US02/38233

PCT Pub. Number WO2003/049159

Priority 10/006,032 03.12.01 US

Filing date 27 November 2002

Wipo publication date 17 June 2003

International Classifications

H01L 021/02 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof -

H01L 021/316 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/318 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 029/92 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

Event Publications

3 April 2003 Complete Application Filed

  Priority application(s): 10/006,032 03.12.01 US

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002359536

19 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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