METHOD FOR FABRICATING A HIGH VOLTAGE POWER MOSFET HAVING A VOLTAGE SUSTAINING REGION THAT INCLUDES DOPED COLUMNS FORMED BY RAPID DIFFUSION

Details for Australian Patent Application No. 2002358312 (hide)

Owner GENERAL SEMICONDUCTOR, INC.

Inventors BLANCHARD, Richard, A.

Pub. Number AU-A-2002358312

PCT Number PCT/US02/41808

PCT Pub. Number WO2003/058683

Priority 10/039,068 31.12.01 US

Filing date 30 December 2002

Wipo publication date 24 July 2003

Event Publications

3 April 2003 Complete Application Filed

  Priority application(s): 10/039,068 31.12.01 US

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2002358312

16 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2002358313-INTERFERENCE COMPENSATION OPTICALLY SYNCHRONIZED SAFETY DETECTION SYSTEM FOR ELEVATOR SLIDING DOORS

2002358311-SYSTEMS AND METHODS FOR THE ANALYSIS OF PROTEIN PHOSPHORYLATION