SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

Details for Australian Patent Application No. 2002357620 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors IWANAGA, Shuji; KATAYAMA, Kyoshige; TADOKORO, Masahide; TANAKA, Michio; UEMURA, Ryouichi

Pub. Number AU-A-2002357620

PCT Number PCT/JP02/13320

PCT Pub. Number WO2003/056610

Priority 2001-391286 25.12.01 JP; 2002-001394 08.01.02 JP

Filing date 19 December 2002

Wipo publication date 15 July 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/30 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Imagewise removal using liquid means

G03F 007/26 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Processing photosensitive materials

Event Publications

3 April 2003 Complete Application Filed

  Priority application(s): 2001-391286 25.12.01 JP; 2002-001394 08.01.02 JP

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2002357620

16 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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