STAGE SYSTEM, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE

Details for Australian Patent Application No. 2002355502 (hide)

Owner NIKON CORPORATION

Inventors NISHI, Kenji

Pub. Number AU-A-2002355502

PCT Number PCT/JP02/07680

PCT Pub. Number WO2003/015139

Priority 2001-241354 08.08.01 JP

Filing date 29 July 2002

Wipo publication date 24 February 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G12B 005/00 Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof

G05D 003/00 Control of position or direction

G01B 011/00 Measuring arrangements characterised by the use of optical means

G01B 021/00 Measuring arrangements or details thereof in so far as they are not adapted to particular types of measuring means of the other groups of this subclass

H02K 041/02 Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path - Linear motors

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 2001-241354 08.08.01 JP

19 June 2003 Application Open to Public Inspection

  Published as AU-A-2002355502

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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