POSITIVE TYPE RADIOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN

Details for Australian Patent Application No. 2002355210 (hide)

Owner JSR CORPORATION

Inventors TAMAKI, Kentarou; UTAKA, Tomohiro; NISHIKAWA, Akira

Pub. Number AU-A-2002355210

PCT Number PCT/JP02/07343

PCT Pub. Number WO2003/010603

Priority 2001-222706 24.07.01 JP; 2001-352419 16.11.01 JP

Filing date 19 July 2002

Wipo publication date 17 February 2003

International Classifications

G03F 007/075 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Silicon-containing compounds

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G02B 006/12 Light guides - of the integrated circuit kind

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 2001-222706 24.07.01 JP; 2001-352419 16.11.01 JP

29 May 2003 Application Open to Public Inspection

  Published as AU-A-2002355210

8 April 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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