PROCESS CHAMBER WITH A BASE WITH SECTIONALLY DIFFERENT ROTATIONAL DRIVE AND LAYER DEPOSITION METHOD IN SUCH A PROCESS CHAMBER

Details for Australian Patent Application No. 2002354988 (hide)

Owner AIXTRON AG

Inventors SCHWAMBERA, Markus; FRANKEN, Walter; STRAUCH, Gerd

Pub. Number AU-A-2002354988

PCT Number PCT/EP02/06294

PCT Pub. Number WO2003/008675

Priority 101 33 914.3 12.07.01 DE

Filing date 10 June 2002

Wipo publication date 3 March 2003

International Classifications

C30B 025/12 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Substrate holders or susceptors

C23C 016/458 Chemical deposition or plating by decomposition - characterised by the method used for supporting substrates in the reaction chamber

C30B 025/14 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Feed and outlet means for the gases

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C30B 025/02 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Epitaxial-layer growth

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 101 33 914.3 12.07.01 DE

22 May 2003 Application Open to Public Inspection

  Published as AU-A-2002354988

8 April 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2002354989-SNIFFING LEAK DETECTOR AND METHOD FOR OPERATION THEREOF

2002354987-METHOD FOR APPLYING A SELFCLEANING COATING TO TEXTILE MATERIALS