CVD SYSTEM COMPRISING A THERMALLY DIFFERENTIATED SUBSTRATE SUPPORT

Details for Australian Patent Application No. 2002354693 (hide)

Owner AIXTRON AG

Inventors KAPPELER, Johannes

Pub. Number AU-A-2002354693

PCT Number PCT/EP02/04405

PCT Pub. Number WO2003/004724

Priority 101 32 448.0 04.07.01 DE

Filing date 22 April 2002

Wipo publication date 21 January 2003

International Classifications

C23C 016/458 Chemical deposition or plating by decomposition - characterised by the method used for supporting substrates in the reaction chamber

C23C 016/46 Chemical deposition or plating by decomposition - characterised by the method used for heating the substrate

C30B 025/12 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Substrate holders or susceptors

C30B 025/10 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Heating of the reaction chamber or the substrate

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 101 32 448.0 04.07.01 DE

22 May 2003 Application Open to Public Inspection

  Published as AU-A-2002354693

18 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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