HIGH-FREQUENCY POWER SOURCE AND ITS CONTROL METHOD, AND PLASMA PROCESSOR

Details for Australian Patent Application No. 2002354459 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors TAKAHIRA, Jun-ichi; SHIMADA, Junichi; HAYAMI, Toshihiro; OHSE, Takeshi

Pub. Number AU-A-2002354459

PCT Number PCT/JP02/12937

PCT Pub. Number WO2003/055286

Priority 2001-375639 10.12.01 JP; 2001-375961 10.12.01 JP

Filing date 10 December 2002

Wipo publication date 9 July 2003

International Classifications

H05H 001/00 Generating plasma

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 2001-375639 10.12.01 JP; 2001-375961 10.12.01 JP

2 October 2003 Application Open to Public Inspection

  Published as AU-A-2002354459

26 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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