PLASMA TREATMENT APPARATUS, MATCHING BOX, IMPEDANCE MATCHING DEVICE, AND COUPLER

Details for Australian Patent Application No. 2002354234 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors HIGASHIURA, Tsutomu

Pub. Number AU-A-2002354234

PCT Number PCT/JP02/13094

PCT Pub. Number WO2003/054940

Priority 2001-380183 13.12.01 JP

Filing date 13 December 2002

Wipo publication date 9 July 2003

International Classifications

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/509 Chemical deposition or plating by decomposition

C23F 004/00 Processes for removing metallic material from surfaces, not provided for in group or

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H03H 007/38 Multiple-port networks comprising only passive electrical elements as network components - Impedance-matching networks

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 2001-380183 13.12.01 JP

2 October 2003 Application Open to Public Inspection

  Published as AU-A-2002354234

2 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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