METHOD FOR FORMING FINE RESIST PATTERN

Details for Australian Patent Application No. 2002354158 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors NITTA, Kazuyuki; SHIMATANI, Satoshi; MASUJIMA, Masahiro

Pub. Number AU-A-2002354158

PCT Number PCT/JP02/12604

PCT Pub. Number WO2003/048865

Priority 2001/369110 03.12.01 JP

Filing date 2 December 2002

Wipo publication date 17 June 2003

International Classifications

G03F 007/40 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment after imagewise removal, e.g. baking

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 2001/369110 03.12.01 JP

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002354158

19 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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