CHEMICAL VAPOR DEPOSITION REACTOR

Details for Australian Patent Application No. 2002353021 (hide)

Owner PRIMAXX, INC.

Inventors GRANT, Robert, W.; PETRONE, Benjamin, J.; BRUBAKER, Matthew, D.; MUMBAUER, Paul, D.

Pub. Number AU-A-2002353021

PCT Number PCT/US02/38565

PCT Pub. Number WO2003/048414

Priority 60/337,639 04.12.01 US; 10/214,272 06.08.02 US

Filing date 4 December 2002

Wipo publication date 17 June 2003

International Classifications

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 60/337,639 04.12.01 US; 10/214,272 06.08.02 US

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002353021

19 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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