HIGH SENSITIVITY RESIST COMPOSITIONS FOR ELECTRON-BASED LITHOGRAPHY

Details for Australian Patent Application No. 2002351269 (hide)

Owner INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventors HUANG, Wu-Song; LI, Wenjie; MOREAU, Wayne; MEDEIROS, David, E.; PETRILLO, Karen, E.; LANG, Rotbert N.; ANGELOPOULOS, Marie

Pub. Number AU-A-2002351269

PCT Number PCT/US02/39048

PCT Pub. Number WO2004/053594

Filing date 5 December 2002

Wipo publication date 30 June 2004

International Classifications

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/30 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Imagewise removal using liquid means

Event Publications

20 March 2003 Complete Application Filed

5 August 2004 Application Open to Public Inspection

  Published as AU-A-2002351269

25 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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