INSPECTION DEVICE AND INSPECTION METHOD FOR PATTERN PROFILE, EXPOSURE SYSTEM

Details for Australian Patent Application No. 2002349599 (hide)

Owner INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventors SUZUKI, Akira; MORITA, Chiaki; YAMADA, Yasuharu; HAYANO, Teruhiko; UDA, Mitsuru; TERAKAWA, Kazunari

Pub. Number AU-A-2002349599

PCT Number PCT/JP02/12465

PCT Pub. Number WO2003/046530

Priority 2001-367400 30.11.01 JP

Filing date 28 November 2002

Wipo publication date 10 June 2003

International Classifications

G01N 021/956 Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

13 March 2003 Complete Application Filed

  Priority application(s): 2001-367400 30.11.01 JP

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002349599

19 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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