POSITIVE RESIST COMPOSITION OF CHEMICAL AMPLIFICATION TYPE, RESIST COATED MATERIAL, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE

Details for Australian Patent Application No. 2002346237 (hide)

International Classifications

Event Publications

6 March 2003 Complete Application Filed

Priority application(s): 2001-239110 07.08.01 JP; 2001-316025 12.10.01 JP; 2001-347737 13.11.01 JP; 2001-196069 28.06.01 JP

15 May 2003 Application Open to Public Inspection

Published as AU-A-2002346237

18 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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