METHOD OF MAKING THIN FILMS DIELECTRICS USING A PROCESS FOR ROOM TEMPERATURE WET CHEMICAL GROWTH OF SIO BASED OXIDES ON A SUBSTRATE

Details for Australian Patent Application No. 2002345885 (hide)

Owner NANODIELECTRICS CORPORATION

Inventors FAUR, Maria; FAUR, Horia, M.; FAUR, Mircea

Pub. Number AU-A-2002345885

PCT Number PCT/US02/20146

PCT Pub. Number WO2003/003439

Priority 09/891,832 26.06.01 US

Filing date 26 June 2002

Wipo publication date 3 March 2003

International Classifications

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

6 March 2003 Complete Application Filed

  Priority application(s): 09/891,832 26.06.01 US

15 May 2003 Application Open to Public Inspection

  Published as AU-A-2002345885

11 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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