RESIST CURABLE RESIN COMPOSITION AND CURED ARTICLE THEREOF

Details for Australian Patent Application No. 2002345367 (hide)

Owner SHOWA DENKO K.K.

Inventors HIRATA, Motoyuki; KOGURE, Eikichi; YAMADA, Kenichi; TAMURA, Kenji

Pub. Number AU-A-2002345367

PCT Number PCT/JP02/06559

PCT Pub. Number WO2003/005126

Priority 2001-203518 04.07.01 JP; 60/304,428 12.07.01 US; 2001-327945 25.10.01 JP; 60/330,816 31.10.01 US

Filing date 28 June 2002

Wipo publication date 21 January 2003

International Classifications

G03F 007/027 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

G03F 007/038 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are rendered insoluble or differentially wettable

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

Event Publications

6 March 2003 Complete Application Filed

  Priority application(s): 2001-203518 04.07.01 JP; 60/304,428 12.07.01 US; 2001-327945 25.10.01 JP; 60/330,816 31.10.01 US

22 May 2003 Application Open to Public Inspection

  Published as AU-A-2002345367

18 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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