POLISHING PAD FOR CMP, METHOD FOR POLISHING SUBSTRATE USING IT AND METHOD FOR PRODUCING POLISHING PAD FOR CMP

Details for Australian Patent Application No. 2002344405 (hide)

Owner HITACHI CHEMICAL CO., LTD. SHIN-KOBE ELECTRIC MACHINERY CO., LTD.

Inventors NISHIYAMA, Masaya; IWATSUKI, Yasuhito; HIRAOKA, Hirokazu; HABIRO, Masanobu

Pub. Number AU-A-2002344405

PCT Number PCT/JP02/10437

PCT Pub. Number WO2003/032379

Priority 2002-20236 29.01.02 JP; 2001-311410 09.10.01 JP

Filing date 8 October 2002

Wipo publication date 22 April 2003

International Classifications

H01L 021/304 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

B24B 053/02 Devices or means for dressing or conditioning abrasive surfaces

B24B 037/00 Lapping machines or devices, i.e. requiring pulverulent abrading substances inserted between a lap of relatively soft but rigid material and the surface to be lapped

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 2002-20236 29.01.02 JP; 2001-311410 09.10.01 JP

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002344405

24 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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