ABERRATION MEASURING DEVICE, ABERRATION MEASURING METHOD, REGULATION METHOD FOR OPTICAL SYSTEM, AND EXPOSURE SYSTEM PROVIDED WITH OPTICAL SYSTEM REGULATED BY THE REGULATION METHOD

Details for Australian Patent Application No. 2002344054 (hide)

Owner NIKON CORPORATION

Inventors SHIRAISHI, Naomasa

Pub. Number AU-A-2002344054

PCT Number PCT/JP02/09810

PCT Pub. Number WO2003/028073

Priority 2001-292878 26.09.01 JP

Filing date 24 September 2002

Wipo publication date 7 April 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G01M 011/02 Testing of optical apparatus - Testing of optical properties

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 2001-292878 26.09.01 JP

26 June 2003 Application Open to Public Inspection

  Published as AU-A-2002344054

17 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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