DEVICE AND METHOD FOR MICROWAVE PLASMA PROCESSING, AND MICROWAVE POWER SUPPLY DEVICE

Details for Australian Patent Application No. 2002344001 (hide)

Owner TOKYO ELECTRON LIMITED GOTO, Naohisa OHMI, Tadahiro

Inventors HIRAYAMA, Masaki; OHMI, Tadahiro; GOTO, Naohisa; GOTO, Tetsuya

Pub. Number AU-A-2002344001

PCT Number PCT/JP02/10847

PCT Pub. Number WO2003/036700

Priority 2001-322529 19.10.01 JP

Filing date 18 October 2002

Wipo publication date 6 May 2003

International Classifications

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/511 Chemical deposition or plating by decomposition

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 2001-322529 19.10.01 JP

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002344001

8 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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