MASSIVELY PARALLEL ATOMIC LAYER DEPOSITION/CHEMICAL VAPOR DEPOSITION SYSTEM

Details for Australian Patent Application No. 2002343583 (hide)

Owner GENUS, INC.

Inventors SEIDEL, Thomas, E.; JANSZ, Adrian; PUCHACZ, Jurek; DOERING, Ken

Pub. Number AU-A-2002343583

PCT Number PCT/US02/34714

PCT Pub. Number WO2003/038145

Priority 60/346,005 29.10.01 US

Filing date 29 October 2002

Wipo publication date 12 May 2003

International Classifications

C23C 016/54 Chemical deposition or plating by decomposition - Apparatus specially adapted for continuous coating

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 60/346,005 29.10.01 US

10 July 2003 Application Open to Public Inspection

  Published as AU-A-2002343583

15 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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