ELEMENTAL SILICON NANOPARTICLE PLATING AND METHOD FOR THE SAME

Details for Australian Patent Application No. 2002343447 (hide)

Owner THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS

Inventors SMITH, Adam; NAYFEH, Tasir; NAYFEH, Munir, H.; BELOMOIN, Gennadiy

Pub. Number AU-A-2002343447

PCT Number PCT/US02/30851

PCT Pub. Number WO2003/044247

Priority 10/002,865 15.11.01 US

Filing date 30 September 2002

Wipo publication date 10 June 2003

International Classifications

C25D 015/00 Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires

C25D 011/32 Electrolytic coating by surface reaction, i.e. forming conversion layers

C25D 007/12 Electroplating characterised by the article coated - Semiconductors

C25D 005/02 Electroplating characterised by the process - Electroplating of selected surface areas

C25D 005/10 Electroplating characterised by the process - Electroplating with more than one layer of the same or of different metals

C25D 009/00 Electrolytic coating other than with metals

C25D 011/00 Electrolytic coating by surface reaction, i.e. forming conversion layers

C25D 013/00 Electrophoretic coating

H01L 021/288 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/445 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C08F 002/58 Processes - Polymerisation initiated by direct application of electric current

C09D 005/44 Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced - for electrophoretic applications

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 10/002,865 15.11.01 US

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002343447

29 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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