METHOD AND SYSTEM FOR MONITORING A SEMICONDUCTOR WAFER PLASMA ETCH PROCESS
Details for Australian Patent Application No. 2002341995 (hide)
International Classifications
Event Publications
27 February 2003 Complete Application Filed
Priority application(s): 10/033,107 26.10.01 US
10 July 2003 Application Open to Public Inspection
Published as AU-A-2002341995
19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired
Application withdrawn under section 141(3)/See Reg. 8.3(2). Note that applications or patents shown as lapsed or ceased may be restored at a later date.
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