METHOD AND APPARATUS FOR ELECTRON DENSITY MEASUREMENT

Details for Australian Patent Application No. 2002341943 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors STRANG, Eric, J.

Pub. Number AU-A-2002341943

PCT Number PCT/US02/31603

PCT Pub. Number WO2003/036309

Priority 60/330,555 24.10.01 US; 60/330,518 24.10.01 US

Filing date 24 October 2002

Wipo publication date 6 May 2003

International Classifications

G01R 027/04 Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom - in circuits having distributed constants

G01N 027/62 Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means - by investigating the ionisation of gases

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 014/00 Coating by vacuum evaporation, by sputtering or by ion implantation

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 60/330,555 24.10.01 US; 60/330,518 24.10.01 US

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002341943

8 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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