RESIST WITH REDUCED LINE EDGE ROUGHNESS

Details for Australian Patent Application No. 2002340923 (hide)

Owner MASSACHUSETTS INSTITUTE OF TECHNOLOGY

Inventors FEDYNYDHYN, Theodore, H.

Pub. Number AU-A-2002340923

PCT Number PCT/US02/14671

PCT Pub. Number WO2002/091084

Priority 09/851,952 09.05.01 US

Filing date 9 May 2002

Wipo publication date 18 November 2002

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 09/851,952 09.05.01 US

1 May 2003 Application Open to Public Inspection

  Published as AU-A-2002340923

26 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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