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Details for Australian Patent Application No. 2002335006 (hide)

Owner MICRON TECHNOLOGY, INC.

Inventors CAMPBELL, Philip, H.; KUBISTA, David, J.

Pub. Number AU-A-2002335006

PCT Number PCT/US02/32741

PCT Pub. Number WO2003/033762

Priority 10/166,902 11.06.02 US; 10/190,792 08.07.02 US; 09/977,612 15.10.01 US

Filing date 15 October 2002

Wipo publication date 28 April 2003

International Classifications

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Event Publications

13 February 2003 Complete Application Filed

  Priority application(s): 10/166,902 11.06.02 US; 10/190,792 08.07.02 US; 09/977,612 15.10.01 US

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002335006

1 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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