MATCHING DEVICE AND PLASMA PROCESSING APPARATUS

Details for Australian Patent Application No. 2002332339 (hide)

Owner TOKYO ELECTRON LIMITED NIHON KOSHUHA CO., LTD.

Inventors ISHII, Nobuo; SHINOHARA, Kibatsu

Pub. Number AU-A-2002332339

PCT Number PCT/JP02/10075

PCT Pub. Number WO2003/030294

Priority 2001/300406 28.09.01 JP

Filing date 27 September 2002

Wipo publication date 14 April 2003

International Classifications

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01J 037/32 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Gas-filled discharge tubes

H01L 021/302 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01P 005/04 Coupling devices of the waveguide type - with variable factor of coupling

Event Publications

6 February 2003 Complete Application Filed

  Priority application(s): 2001/300406 28.09.01 JP

26 June 2003 Application Open to Public Inspection

  Published as AU-A-2002332339

17 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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