DUAL FREQUENCY PLASMA ETCH REACTOR WITH INDEPENDENT PLASMA DENSITY/CHEMISTRY AND ION ENERGY CONTROL

Details for Australian Patent Application No. 2002331019 (hide)

Owner LAM RESEARCH CORPORATION

Inventors LENZ, Eric; LI, Lumin; DHINDSA, Rajinder; SRINIVASAN, Mukund

Pub. Number AU-A-2002331019

PCT Number PCT/US02/25223

PCT Pub. Number WO2003/015123

Priority 10/032,279 31.12.01 US; 60/311,050 08.08.01 US

Filing date 8 August 2002

Wipo publication date 24 February 2003

International Classifications

H01J 037/32 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Gas-filled discharge tubes

Event Publications

6 February 2003 Complete Application Filed

  Priority application(s): 10/032,279 31.12.01 US; 60/311,050 08.08.01 US

19 June 2003 Application Open to Public Inspection

  Published as AU-A-2002331019

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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