TREATING DEVICE USING TREATING GAS, AND METHOD OF OPERATING THE SAME

Details for Australian Patent Application No. 2002330466 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors NAGASEKI, Kazuya; HIRAYAMA, Yusuke

Pub. Number AU-A-2002330466

PCT Number PCT/JP02/08829

PCT Pub. Number WO2003/019639

Priority 2001-264529 31.08.01 JP

Filing date 30 August 2002

Wipo publication date 10 March 2003

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

B01J 019/08 Chemical, physical, or physico-chemical processes in general - Processes employing the direct application of electric or wave energy, or particle radiation

C23F 004/00 Processes for removing metallic material from surfaces, not provided for in group or

Event Publications

30 January 2003 Complete Application Filed

  Priority application(s): 2001-264529 31.08.01 JP

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002330466

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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