PHOTOLITHOGRAPHIC MASK FABRICATION

Details for Australian Patent Application No. 2002330200 (hide)

Owner INTEL CORPORATION

Inventors YAN, Pei-Yang

Pub. Number AU-A-2002330200

PCT Number PCT/US02/31415

PCT Pub. Number WO2003/029897

Priority 09/969,156 03.10.01 US

Filing date 2 October 2002

Wipo publication date 14 April 2003

International Classifications

G03F 001/14 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals characterised by structural details, e.g. supports, cover layers, pellicle rings

Event Publications

30 January 2003 Complete Application Filed

  Priority application(s): 09/969,156 03.10.01 US

26 June 2003 Application Open to Public Inspection

  Published as AU-A-2002330200

17 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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