IMPROVED POST PLASMA ASHING WAFER CLEANING FORMULATION

Details for Australian Patent Application No. 2002329789 (hide)

Owner ADVANCED TECHNOLOGY MATERIALS, INC.

Inventors WOJTCZAK, William, A.; SEIJO, Fatima, Ma.; KLOFFENSTEIN, Thomas, J.; FINE, Daniel, N.

Pub. Number AU-A-2002329789

PCT Number PCT/US02/26487

PCT Pub. Number WO2003/035814

Priority 09/954,284 17.09.01 US

Filing date 20 August 2002

Wipo publication date 6 May 2003

International Classifications

C11D 003/30 Other compounding ingredients of detergent compositions covered in group

H01L 021/3105 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

B08B 003/08 Cleaning by methods involving the use or presence of liquid or steam - the liquid having chemical or dissolving effect

Event Publications

30 January 2003 Complete Application Filed

  Priority application(s): 09/954,284 17.09.01 US

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002329789

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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