MASK AND METHOD FOR PRODUCING A MASK

Details for Australian Patent Application No. 2002328892 (hide)

Owner TEAM NANOTEC GMBH

Inventors BAYER, Thomas; GRESCHNER, Johann; KALT, Samuel; WEISS, Helga

Pub. Number AU-A-2002328892

PCT Number PCT/EP02/07824

PCT Pub. Number WO2003/014829

Priority 101 37 834.3 02.08.01 DE

Filing date 13 July 2002

Wipo publication date 24 February 2003

International Classifications

G03F 001/14 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals characterised by structural details, e.g. supports, cover layers, pellicle rings

G03F 001/16 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals having apertures, e.g. for corpuscular lithography

Event Publications

30 January 2003 Complete Application Filed

  Priority application(s): 101 37 834.3 02.08.01 DE

19 June 2003 Application Open to Public Inspection

  Published as AU-A-2002328892

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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