TREATING DEVICE AND CLEANING METHOD THEREFOR

Details for Australian Patent Application No. 2002328592 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors TAKAHASHI, Hiroyuki; KAWAMURA, Kohei; MIYOSHI, Hidenori; CHUNG, Gishi; OSHIMA, Yasuhiro

Pub. Number AU-A-2002328592

PCT Number PCT/JP02/08089

PCT Pub. Number WO2003/014413

Priority 2001-239720 07.08.01 JP

Filing date 7 August 2002

Wipo publication date 24 February 2003

International Classifications

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

B01J 019/08 Chemical, physical, or physico-chemical processes in general - Processes employing the direct application of electric or wave energy, or particle radiation

B08B 005/00 Cleaning by methods involving the use of air flow or gas flow

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

23 January 2003 Complete Application Filed

  Priority application(s): 2001-239720 07.08.01 JP

19 June 2003 Application Open to Public Inspection

  Published as AU-A-2002328592

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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