PHOTOSENSITIVE RESIN COMPOSITION

Details for Australian Patent Application No. 2002325340 (hide)

Owner CIBA SPECIALTY CHEMICALS HOLDING INC.

Inventors KURA, Hisatoshi; OKA, Hidetaka; OHWA, Masaki

Pub. Number AU-A-2002325340

PCT Number PCT/EP02/07989

PCT Pub. Number WO2003/010602

Priority 01810734.2 26.07.01 EP

Filing date 18 July 2002

Wipo publication date 17 February 2003

International Classifications

G03F 007/031 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Organic compounds not covered by group

G03F 007/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces

Event Publications

16 January 2003 Complete Application Filed

  Priority application(s): 01810734.2 26.07.01 EP

29 May 2003 Application Open to Public Inspection

  Published as AU-A-2002325340

8 April 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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