Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern

Details for Australian Patent Application No. 2002323952 (hide)

Owner JSR CORPORATION

Inventors Bessho, Nobuo; Kumano, Atsushi; Yamada, Kenji; Nishimura, Isao

Pub. Number AU-A-2002323952

PCT Number PCT/JP02/07561

PCT Pub. Number WO2003/012547

Priority 2001-233520 01.08.01 JP

Filing date 25 July 2002

Wipo publication date 17 February 2003

International Classifications

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

H01L 021/312 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 023/12 Details of semiconductor or other solid state devices - Mountings, e.g. non-detachable insulating substrates

G03F 007/36 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Imagewise removal not covered by groups , e.g. using gas streams, using plasma

C08L 101/00 Compositions of unspecified macromolecular compounds

Event Publications

16 January 2003 Complete Application Filed

  Priority application(s): 2001-233520 01.08.01 JP

29 May 2003 Application Open to Public Inspection

  Published as AU-A-2002323952

19 February 2009 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(d). Examination has been requested or an examination report has issued for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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