CMP APPARATUS AND METHOD FOR POLISHING MULTIPLE SEMICONDUCTOR WAFERS ON A SINGLE POLISHING PAD USING MULTIPLE SLURRY DELIVERY LINES

Details for Australian Patent Application No. 2002323411 (hide)

Owner ORIOL, INC.

Inventors JEONG, In-Kwon

Pub. Number AU-A-2002323411

PCT Number PCT/US02/27138

PCT Pub. Number WO2003/025996

Priority 09/956,451 18.09.01 US

Filing date 27 August 2002

Wipo publication date 1 April 2003

International Classifications

H01L 021/4763 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/304 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

B24B 007/22 Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces

Event Publications

16 January 2003 Complete Application Filed

  Priority application(s): 09/956,451 18.09.01 US

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002323411

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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