FREE-STANDING (AL, GA, IN)N AND PARTING METHOD FOR FORMING SAME

Details for Australian Patent Application No. 2002323101 (hide)

Owner ADVANCED TECHNOLOGY MATERIALS, INC.

Inventors VAUDO, Robert, P.; BRANDES, George, R.; TISCHLER, Michael, A.; KELLY, Michael, K.

Pub. Number AU-A-2002323101

PCT Number PCT/US02/25412

PCT Pub. Number WO2003/020497

Priority 09/947,253 05.09.01 US

Filing date 12 August 2002

Wipo publication date 18 March 2003

International Classifications

B29D 022/00 Producing hollow articles

B32B 001/08 Layered products essentially having a general shape other than plane

B32B 003/02 Layered products essentially comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form - characterised by features of form at particular places, e.g. in edge regions

B32B 003/00 Layered products essentially comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form

C30B 023/00 Single-crystal growth from vapours

C30B 025/00 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth

C30B 028/12 Production of homogeneous polycrystalline material with defined structure

C30B 028/14 Production of homogeneous polycrystalline material with defined structure

C30B 029/10 Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape - Inorganic compounds or compositions

C30B 029/38 Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape

B29D 023/00 Producing tubular articles

Event Publications

16 January 2003 Complete Application Filed

  Priority application(s): 09/947,253 05.09.01 US

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002323101

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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