A METHOD OF SUBSTRATE PROCESSING AND PHOTORESIST EXPOSURE

Details for Australian Patent Application No. 2002322545 (hide)

Owner INTEL CORPORATION (a corporation of Delaware)

Inventors AMINZADEH, Mehran; FAHY, Michael

Pub. Number AU-A-2002322545

PCT Number PCT/US02/23090

PCT Pub. Number WO2003/017006

Priority 09/930,840 15.08.01 US

Filing date 18 July 2002

Wipo publication date 3 March 2003

International Classifications

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G03F 009/00 Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Event Publications

16 January 2003 Complete Application Filed

  Priority application(s): 09/930,840 15.08.01 US

29 May 2003 Application Open to Public Inspection

  Published as AU-A-2002322545

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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